Table 3 Electrochemical parameters and inhibition efficiencies investigated from EIS data of the copper metal in 1.0 M HCl solution containing different concentrations of the inhibitor (HL) at 25 °C.

From: Exploring corrosion behavior, antimicrobial evaluation, molecular docking and DFT calculation of thiosemicarbazone ligand and its metal complexes

 

Conc., M

Rs Ω cm2

Rct Ω cm2

Q

Cdl μF cm2−

\(IE\%\)

Yo μΩ cm−2

n

Blank

–

1.350

6.590

3850

0.44

17.600

–

Various conc. of the inhibitor (HL)

1 × 10–4

1.960

14.500

2304

0.52

9.430

54.55

1 × 10–5

2.310

46.300

1145

0.64

4.760

85.76

1 × 10–6

1.120

72.400

892

0.70

3.770

90.89

1 × 10–7

1.160

93.200

480

0.79

2.160

92.93

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