Table 3 SOA yields from aliphatic precursors.
From: Formation of secondary organic aerosols from anthropogenic precursors in laboratory studies
Alkane-precursors | Experimental conditions | Mass yield | References |
|---|---|---|---|
Linear alkanes | |||
C8–15 alkanes | Chamber-based high NOx, OH oxidation | 0.05–0.56 | Lim and Ziemann21 |
C6–17 alkanes | Chamber-based high NOx, OH oxidation | 0–0.877 | Lim and Ziemann33 |
C7 alkanes | OFR, low NOx, OH oxidation | 0.044–0.960 | Li et al.35 |
C8 alkanes | Chamber, high NOx, Cl, dry/humid | 0.16–0.28/0.24 | Wang and Hildebrandt Ruiz94 |
C10 alkanes | Chamber-based high NOx, OH oxidation | up to 0.51 | Presto et al.26 |
Chamber-based OH oxidation | 0.39, 0.69, 1.1 | Lambe et al.132 | |
Chamber-based OH oxidation | 0.96–0.25 | Hunter et al.24 | |
OFR, low NOx, OH oxidation | 0.044–0.960 | Li et al.35 | |
Chamber, high NOx, Cl, dry/humid | 0.45–0.85/0.5 | Wang and Hildebrandt Ruiz94 | |
C12 alkanes | Chamber-based high NOx, OH oxidation | up to 0.51 | Presto et al.26 |
Chamber-based high NOx, OH oxidation | 0.10 | Tkacik et al.27 | |
Chamber-based high NOx, OH oxidation | 0.23–0.62 | Loza et al.23 | |
Chamber-based low NOx, OH oxidation | 0.03–0.28 | Loza et al.23 | |
Chamber, high NOx, Cl, dry/humid | 1.25–1.65/1.10 | Wang and Hildebrandt Ruiz94 | |
OFR, low NOx OH oxidation | 0.044–0.960 | Li et al.35 | |
C15 alkanes | Chamber-based high NOx, OH oxidation | up to 0.51 | Presto et al.26 |
Chamber-based OH oxidation | 0.39, 0.69, 1.1 | Lambe et al.132 | |
C17 alkanes | Chamber-based high NOx, OH oxidation | up to 0.51 | Presto et al.26 |
Chamber-based OH oxidation | 0.39, 0.69, 1.1 | Lambe et al.132 | |
Tricyclo[5.2.1.02,6]decane | Chamber-based OH oxidation | 0.39, 0.69, 1.1 | Lambe et al.132 |
Branched | |||
C6–11 branched alkanes | Chamber-based high NOx, OH oxidation | 0.040–0.919 | Lim and Ziemann33 |
n-Pentylcyclohexane (C11), 2-methylundecane (C12), 7-methyltridecane (C14), and 2,6,10,14-tetramethylpentadecane (C19) | Chamber-based high NOx, OH oxidation | 0.05–.08 | Tkacik et al.27 |
2-Methylundecane | Chamber-based high NOx, OH oxidation | 0.05–.08 | Tkacik et al.27 |
Chamber-based high NOx, OH oxidation | 0.11–0.61 | Loza et al.23 | |
Chamber-based low NOx, OH oxidation | 0.14–0.65 | Loza et al.23 | |
Hexylcyclohexane | Chamber-based high NOx, OH oxidation | 0.11–0.61 | Loza et al.23 |
Chamber-based low NOx, OH oxidation | 0.14–0.65 | Loza et al.23 | |
Cyclic | |||
C6-8,10,12,15 cyclic alkanes | Chamber-based high NOx, OH oxidation | 0.008–0.613 | Lim and Ziemann33 |
C8 cyclic alkanes | Chamber-based high NOx, OH oxidation | 0.11,0.25 | Tkacik et al.27 |
C10 cyclic alkanes | Chamber-based high NOx, OH oxidation | 0.11,0.25 | Tkacik et al.27 |
Chamber-based OH oxidation | 0.96–1.37 | Hunter et al.24 | |
OFR, low NOx, OH oxidation | 1.639–2.121 | Li et al.35 | |
C12 cyclic alkanes | Chamber-based high NOx, OH oxidation | 0.8–1.6 | Loza et al.23 |
Chamber-based low NOx, OH oxidation | 0.22–0.86 | Loza et al.23 | |
Polycyclic (decalin (C10H18), pinane (C10H18), tricyclo[5.2.1.02,6]decane (C10H16), and adamantane (C10H16)) | Chamber-based OH oxidation | 0.38–1.81 | Hunter et al.24 |
Decalin | OFR, low NOx, OH oxidation | 1.532–2.298 | Li et al.35 |