Table 4 SOA yields from aromatic precursors.
From: Formation of secondary organic aerosols from anthropogenic precursors in laboratory studies
Precursors | Experimental conditions | Mass yield | References |
|---|---|---|---|
Toluene | Chamber, sunlight-irradiated hydrocarbon−NOx mixtures | 0.015–0.037 | Izumi and Fukuyama133 |
OH radical, chamber, NOx | 1.59 | Kleindienst et al.134 | |
Smog chamber, sunlight-irradiated, propene, OH radical | 0.019–0.082 | Odum et al.131 | |
OH radical, Toluene/propylene/ NOx /air mixtures | 0.021–0.055 | Edney et al.19 | |
OH radical, chamber, low- NOx | 0.298–0.308 | Ng et al.25 | |
OH radical, chamber, high- NOx | 0.08–0.128 | Ng et al.25 | |
OH radical, chamber, low- NOx, acidic | 0.295 | Ng et al.25 | |
OH radical, chamber, high- NOx, acidic | 0.167 | Ng et al.25 | |
OH radical, chamber, NOx | 0.19–0.38 | Chen et al.139 | |
Chamber, OH radical | 0.08–0.20 | Li et al.79 | |
OFR, OH radical, wet seeds | 1.31 | Liu et al.150 | |
OFR, OH radical, dry seeds | 1.1 | Liu et al.150 | |
Ethyltoluenes | Smog chamber, sunlight-irradiated, propene, OH radical | 0.019–0.082 | Odum et al.131 |
o- Ethyl toluene | Chamber, sunlight-irradiated hydrocarbon−NOx mixtures | 0.015–0.037 | Izumi and Fukuyama133 |
OH radical, chamber, low- NOx | 0.141–0.237 | Li et al.138 | |
m-Ethyltoluene | Chamber, sunlight-irradiated hydrocarbon−NOx mixtures | 0.015–0.037 | Izumi and Fukuyama133 |
OH radical, chamber, low- NOx | 0.020–0.167 | Li et al.138 | |
p-Ethyltoluene | Chamber, sunlight-irradiated hydrocarbon−NOx mixtures | 0.015–0.037 | Izumi and Fukuyama133 |
OH radical, chamber, low- NOx | 0.039–0.122 | Li et al.138 | |
Benzene | OH radical, chamber, low- NOx | 0.369 | Ng et al.25 |
OH radical, chamber, high- NOx | 0.281 | Ng et al.25 | |
Chamber, OH radical, NOx | 0.018–0.312 | Sato et al.77 | |
Photoreactor, OH radical | 0.53 | Borrás and Tortajada-Genaro141 | |
Chamber, OH radical | 0.08–0.35 | Li et al.79 | |
Ethylbenzene | Chamber, sunlight-irradiated hydrocarbon−NOx mixtures | 0.015–0.037 | Izumi and Fukuyama133 |
Smog chamber, sunlight-irradiated, propene, OH radical | 0.019–0.082 | Odum et al.131 | |
OH radical, chamber, low- NOx | 0.013–0.167 | Li et al.138 | |
n-Propylbenzene | Smog chamber, sunlight-irradiated, propene, OH radical | 0.019–0.082 | Odum et al.131 |
OH radical, chamber, low- NOx | 0.051–0.054 | Li et al.138 | |
Pentamethylbenzene | Chamber, OH radical | 0.03–0.04 | Li et al.79 |
Hexamethylbenzene | Chamber, OH radical | 0.02–0.03 | Li et al.79 |
Ispropylbenzene | OH radical, chamber, low- NOx | 0.031–0.110 | Li et al.138 |
Trimethylbenzenes, dimethylethylbenzenes, tetramethylbenzenes | Smog chamber, sunlight-irradiated, propene, OH radical | 0.030–0.124 | Odum et al.131 |
1, 2, 4-Trimethylbenzene | OH radical, chamber, propene | 0.026–0.0967 | Odum et al.130 |
Chamber, OH radical | 0.03–0.07 | Li et al.79 | |
1,3,5- Trimethylbenzene | OH radical, chamber, NOx | 0.41 | Kleindienst et al.134 |
OH radical, chamber, high- NOx | 0.0029–0.0747 | Wyche et al.76 | |
OH radical, chamber, low- NOx | 0.0621–0.0637 | Wyche et al.76 | |
Chamber, OH radical, NOx | 0.025–0.156 | Sato et al.77 | |
OH radical, chamber, low- NOx | 0.007–0.065 | Li et al.138 | |
1,2,4,5- Trimethylbenzene | Chamber, OH radical | 0.01–0.03 | Li et al.79 |
1,2,3- Trimethylbenzene | OH radical, chamber, low- NOx | 0.075–0.119 | Li et al.138 |
o-Xylene | OH radical, chamber | 0.011–0.234 | Song et al.75 |
OH radical, chamber, low- NOx | 0.044–0.091 | Li et al.138 | |
m-Xylene | OH radical, chamber, propene | 0.0019–1.0 | Odum et al.130 |
OH radical, chamber, NOx | 0.032–0.141 | Song et al.135 | |
OH radical, chamber, low- NOx | 0.357–0.377 | Ng et al.25 | |
OH radical, chamber, high- NOx | 0.035–0.08 | Ng et al.25 | |
OH radical, chamber, low- NOx, acidic | 0.404 | Ng et al.25 | |
OH radical, chamber, high- NOx, acidic | 0.263 | Ng et al.25 | |
OH radical, chamber, NOx, no seed | 0.06–0.08 | Lu et al.137 | |
OH radical, chamber, NOx, seed | 0.05–0.12 | Lu et al.137 | |
Chamber, OH radical | 0.08–0.14 | Li et al.79 | |
p-Xylene | OH radical, chamber, NOx | 1.09 | Kleindienst et al.134 |
OH radical, chamber | 0.011–0.234 | Song et al.75 | |
OH radical, chamber, NOx | 0.064–0.13 | Healy et al.136 | |
OH radical, chamber, low- NOx | 0.024–0.041 | Li et al.138 | |
Xylenes | Smog chamber, sunlight-irradiated, propene, OH radical | 0.030–0.124 | Odum et al.131 |
Naphthalene | OH radical, chamber, low- NOx | 0.58–0.73 | Chan et al.140 |
OH radical, chamber, high- NOx | 0.19–0.39 | Chan et al.140 | |
OH radical, chamber, low- NOx | 0.02–0.22 | Shakya and Griffin82 | |
Cl, UV smog chamber | 0.85–0.98 | Riva et al.91 | |
1-Methylnaphthalene | OH radical, chamber, low- NOx | 0.58–0.73 | Chan et al.140 |
OH radical, chamber, high- NOx | 0.19–0.39 | Chan et al.140 | |
OH radical, chamber, low- NOx | 0.02–0.22 | Shakya and Griffin82 | |
2-Methylnaphthalene | OH radical, chamber, low- NOx | 0.58–0.73 | Chan et al.140 |
OH radical, chamber, high- NOx | 0.19–0.39 | Chan et al.140 | |
OH radical, chamber, low- NOx | 0.02–0.22 | Shakya and Griffin82 | |
1,2-Dimethylnaphthalene | OH radical, chamber, high- NOx | 0.19–0.39 | Chan et al.140 |
Acenaphthylene | OH radical, chamber, low- NOx | 0.02–0.22 | Shakya and Griffin82 |
Cl, UV smog chamber | 0.85–0.98 | Riva et al.91 | |
Acenaphthene | OH radical, chamber, low- NOx | 0.02–0.22 | Shakya and Griffin82 |
Cl, UV smog chamber | 0.85–0.98 | Riva et al.91 | |
Catechol | NO3 radical, chamber, NOx | 1.50 ± 0.2 | Finewax et al.102 |
OH radical, chamber, NOx | 1.34 ± 0.2 | ||
Resorcinol (1,3-benzenediol) | NO3 radical, chamber, NOx | 0.09 | Finewax et al.103 |
OH radical, chamber, NOx | 0.86 |
