Fig. 8: Bandgap engineering by dielectric environment. | npj 2D Materials and Applications

Fig. 8: Bandgap engineering by dielectric environment.

From: Bandgap engineering of two-dimensional semiconductor materials

Fig. 8: Bandgap engineering by dielectric environment.

a Survey of recent experimentally observed optical gaps of 2D materials in different dielectric environments. For TMDC, lowest energies correspond to samples encapsulated in h-BN. In general, energies increase as the substrate is changed from h-BN to SiO2, CYTOP, MgO, Al2O3, and LaAlO3, respectively167. For N-BP, lower energies correspond to samples on sapphire covered by h-BN173, whereas uncovered samples on Si/SiO2 substrate181 exhibit higher energy. b Difference between optical bandgaps (top) of the suspended monolayer (ε = 1) and those in a medium with an effective dielectric constant \({\varepsilon }_{m}=\frac{{\varepsilon }_{1}+{\varepsilon }_{2}}{2}\) for four TMDC, as calculated by solving SBE for the gapped Dirac Hamiltonian72. The parameter r0 was fitted for each TMDC as to obtain the experimental optical bandgap: 1.91 eV for suspended MoS2279 using r0 = 108 Å, 1.66 eV for MoSe2 deposited on SiO2280 with r0 = 90 Å, 1.74 eV for WSe2 deposited on SiO2178 with r0 = 47 Å, and 2.04 eV for WS2 deposited on SiO2281 with r0 = 23 Å. The other parameters were obtained from the GGA calculations of ref. 282. The effect on the QP bandgap, as calculated by the method explained in the Supplemental Material, is shown in the bottom panel.

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