Fig. 1: PMMA transfer residue cleaning via H2 Downstream Plasma Source (DPS).
From: Enhancing dielectric passivation on monolayer WS2 via a sacrificial graphene oxide seeding layer
a, d AFM images after tip cleaning of solvent treated graphene without plasma exposure, where PMMA residues pile up on the scan edge (4 µm2) when brushed away by the AFM tip. b, e No PMMA pile-up is noted for graphene treated with a solvent and 3- or c, f 6 s H2 DPS exposure.
