Fig. 2: Surface modification of the TMDCs via oxygen plasma and treatment with the AgCN growth solution.

a The density of the AgCN microwires grown on MoS2 and WSe2 under different plasma treatment conditions. The error bars indicate the standard deviation from 10 to 15 samples. b–d AFM topography images of pristine, plasma-treated, and ammonia water-treated MoS2. e Raman spectra of pristine, plasma-treated, and ammonia water-treated MoS2; the metal oxide is marked with a red signal. f Schematics showing the effect of plasma treatment and ammonia water during the AgCN growth. The oxygen plasma treatment leads to the formation of a surface metal-oxide layer, and ammonia water selectively removes the metal oxide.