Fig. 2: Visually transparent NIR-sensitive OPD.
From: A touchless user interface based on a near-infrared-sensitive transparent optical imager
a, Device layout of a discrete NIR-sensitive OPD. b, Chemical structures of PCE-10 (also called PTB7-Th) and IEICO-4F. c, Band diagram of the NIR-sensitive OPD. d, Top-view schematic of a printed Cu grid TCE, showing line width (WCu), pitch (PCu), gap and unit cell (red dashed enclosure). e, Microscopic image of the printed Cu grid TCE with WCu and PCu of 1 and 20 μm, respectively. f, Schematic of a part of the patterned parallel OPD subpixel array design that forms an OPD main pixel: OPD subpixel width (WOPD), OPD subpixel pitch (POPD), OPD subpixel overlap with edge cover layer (ROPD). The grey grid lines represent the printed Cu grid shown in e. g, Micrograph of patterned OPD subpixels with WOPD, POPD and ROPD of 50, 240 and 10 μm, respectively.
