Table 1 The relative permittivity, bandgap, and mobility of silicon, germanium, gallium arsenide, SiO2, and Al2O3 used in the model, referred from the database.

From: Asymmetric bias-induced barrier lowering as an alternative origin of current rectification in geometric diodes

Material

Relative permittivity

Bandgap (eV)

Electron mobility (cm2 V−1 s−1)

Hole mobility (cm2 V−1 s−1)

Silicon

11.7

1.12

1417

470.5

Germanium

16.2

0.66

3900

1900

GaAs

12.9

1.42

9400

491.5

SiO2

3.9

9.0

-

-

Al2O3

9.0

8.72

-

-