Fig. 2: Dispersion management of the TFLN waveguide for AMX-suppressed microresonators. | Communications Physics

Fig. 2: Dispersion management of the TFLN waveguide for AMX-suppressed microresonators.

From: Widely-tunable, multi-band Raman laser based on dispersion-managed thin-film lithium niobate microring resonators

Fig. 2: Dispersion management of the TFLN waveguide for AMX-suppressed microresonators.The alternative text for this image may have been generated using AI.

a The schematic cross-section of the TFLN waveguide which is defined by a waveguide height (H), a waveguide width (W), a sidewall angle (θ), and an etch depth (h). b The TE00 and TE10 mode profiles in a 2.2-μm-wide LFTN waveguide (H = 360 nm and h = 180 nm). c Color: The effective area of TE00 mode versus the waveguide height (H) and waveguide width (W) (h = H/2). The black contours indicate the group velocity dispersion (GVD) of TE00 mode. d Color: The effective area of the TE00 mode versus the etching depth (h) and waveguide width (H = 360 nm). The blue contours represent the effective refractive index difference of TE00 and TE10 modes, and the red contours are the occurrences of AMX within the pump and Raman lasing tuning range (1500–2000 nm).

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