Fig. 3: TEM studies describing the microstructure.
From: Mechanistic study of superlattice-enabled high toughness and hardness in MoN/TaN coatings
The HR-TEM micrographs (a) and (c) show a cross section of coatings with a nominal bilayer period of 9.0 and 3.0 nm, respectively. The white marked area in (c) was used to generate the FFT pattern in (f) calculated by Gatan Digital Micrograph. The TEM top view in (d) was taken from the sample with Λ = 1.5 nm, the column width was calculated using the linear intercept method. (b) and (e) show a SAED pattern of the region in (a) and (d), respectively, including an integration of the pattern. The scale bars in (a) and (c) are 10 nm, in (b) and (e) 5 nm−1, in (d) 200 nm, and in (f) 10 nm−1.
