Figure 4
The physical properties of suspended SWCNT micro-lines and its resonating properties.
(a) Schematic of a tipless AFM cantilever fabricated by focused ion beam. For the electromechanical test, 50 nm-thick Pd was deposited on SU-8 substrate as the contact pads for SWCNT network and electrical bias was applied to the SWCNT through contact pads during the indentation process. (b) The dependence of applied load versus central deflection of SWCNT film. (c) The measured change of current (ΔI) with respect to calculated indentation depth (Δl) of suspended SWCNT micro-lines (widths b = 10.7 μm). (d) Resonance response of a suspended SWCNT micro-line (6 μm in width) bridge over a 10 μm trench.
