Figure 1

Schematic illustration of the process for the fabrication of a free-standing wrinkled PANI-based film and the effect of the additional deposition of PPy on the pattern stability and film integrity: in-situ self-wrinkling PANI film which is grown on a PDMS(n:1) substrate (I), followed by air drying (II); the additional growth of PPy inside the wrinkled PANI film to fabricate a PDMS(n:1)/PANI/PPy film with a relatively low (III) and high (V) content of PPy, followed by air drying (IV and VI), as well as peeling from the PDMS(n:1) substrate to obtain a free-standing one (VII) and further transferring it onto target substrates (VIII).