Figure 4
TEM image of (a) TiN/SiO2/Si (Ref.), (b) TiN/LaO 10 Å/SiO2/Si and (c) TiN/ZrO 11 Å/SiO2/Si stack structure. The work function of (d) reference sample (e) LaO and (f) ZrO sample according to the depth profiling. The schematic work function depth profiling of (g) reference sample, (h) LaO and (i) ZrO.
