The origin of large mobility modulation in ultrathin oxide transistors, promising for their high on-off ratio, remains mostly unknown. Here, a 106 gate-induced mobility modulation in 3.5 nm-thick TiOx transistors is explained by a high density of tail states, mediating variable range hopping of carriers.
- Nikhil Tiwale
- Ashwanth Subramanian
- Chang-Yong Nam