Ferroelectric HfO2 and related materials are promising for device applications, given that non-ferroelectric HfO2 is already used for applications at the industrial scale, is CMOS-compatible and is robust to degradation. This Review summarizes the properties and origin of ferroelectricity in HfO2-based materials and surveys their potential applications.
- Uwe Schroeder
- Min Hyuk Park
- Cheol Seong Hwang