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Showing 1–3 of 3 results
Advanced filters: Author: Souvik Mahapatra Clear advanced filters

  • In the standard Si transistor gate stack, replacing conventional dielectric HfO2 with an ultrathin ferroelectric–antiferroelectric HfO2–ZrO2 heterostructure exhibiting the negative capacitance effect demonstrates ultrahigh capacitance without degradation in leakage and mobility, promising for ferroelectric integration into advanced logic technology.

    • Suraj S. Cheema
    • Nirmaan Shanker
    • Sayeef Salahuddin
    Research
    Nature
    Volume: 604, P: 65-71

  • In an inter-laboratory study, the authors compare the accuracy and performance of three optical density calibration protocols (colloidal silica, serial dilution of silica microspheres, and colony-forming unit (CFU) assay). They demonstrate that serial dilution of silica microspheres is the best of these tested protocols, allowing precise and robust calibration that is easily assessed for quality control and can also evaluate the effective linear range of an instrument.

    • Jacob Beal
    • Natalie G. Farny
    • Jiajie Zhou
    ResearchOpen Access
    Communications Biology
    Volume: 3, P: 1-29