This study demonstrates the use of molecularly tailored self-assembled monolayers (SAMs) as ultrathin diffusion barriers and adhesion liners for Ru interconnects. Compared to non-functionalized and methyl-terminated surfaces, hydroxylated arylimine SAMs such as 2-HBITES effectively suppress Ru interdiffusion, prevent film delamination, and significantly enhance thermal stability up to 700 °C. The SAM-functionalized interfaces exhibit improved adhesion and structural integrity, offering a promising strategy for future scaled interconnect technologies.
- Hong-Yi Wu
- Yi-Ying Fang
- Pei Yuin Keng
