Figure 1: Preparation of
/ml-G films.

The films were prepared by spin coating on clean substrate a chitosan solution that is subsequently immersed in HAuCl4 solution and pyrolysis at 900 °C under inert atmosphere.
/ml-G films.
The films were prepared by spin coating on clean substrate a chitosan solution that is subsequently immersed in HAuCl4 solution and pyrolysis at 900 °C under inert atmosphere.