Abstract
The development of nano- and micropatterned materials is a key component of advanced nanotechnology. We report herein, a photo-based method for patterning general-purpose polymer films. Patterned ultraviolet (UV) light irradiation of a thin polystyrene film under controlled temperature generates surface relief structures by mass transfer from shaded to irradiated areas. The resulting surface relief structure can be arbitrarily erased by heating and reconstructed by patterned UV light irradiation, and this process is repeatable. This new method thus enables fabrication of dynamic reversible patterning structures from various general polymers.
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Acknowledgements
We thank Enago (http://www.enago.jp) for the English language review. This work was supported in part by a Grant-in-Aid for Scientific Research (23750153) from the Ministry of Education, Culture, Sports, Science and Technology and the Foundation for the Promotion of Material Science and Technology of Japan (MST Foundation).
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Ubukata, T., Moriya, Y. & Yokoyama, Y. Facile one-step photopatterning of polystyrene films. Polym J 44, 966–972 (2012). https://doi.org/10.1038/pj.2012.40
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DOI: https://doi.org/10.1038/pj.2012.40
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