Fig. 3: Resistance evolution for the thinning and breakdown process for: | Microsystems & Nanoengineering

Fig. 3: Resistance evolution for the thinning and breakdown process for:

From: Sub-10 nm nanogap fabrication on suspended glassy carbon nanofibers

Fig. 3

a dry-air at atmospheric pressure (GCNF with L = 41.5 µm and D = 1.1 µm), b CO2 at atmospheric pressure (GCNF with L = 39.4 µm and D = 1.0 µm), c high vacuum after purging the chamber with dry-air (GCNF with L = 48.7 µm and D = 1.6 µm), and d high vacuum after purging the chamber with CO2 (GCNF with L = 57.2 µm and D = 1.2 µm).

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