Fig. 1: Fabrication of gradient nanostructure by interference lithography.
From: Gradient wettability induced by deterministically patterned nanostructures
a Schematic of the interference lithography principle and laser source with a Gaussian distribution for gradient pattern formation. b Photograph of the photoresist pattern after development with two orthogonal interference exposures during lithography, where R is the distance from the center. c SEM images of photoresist nanostructures at different positions along the radial direction
