Fig. 5: Experimental setup of the exposure system. Inset: magnified image showing the two half-wave plates and orthogonal two-axis Lloyd’s mirror interference unit. | Microsystems & Nanoengineering

Fig. 5: Experimental setup of the exposure system. Inset: magnified image showing the two half-wave plates and orthogonal two-axis Lloyd’s mirror interference unit.

From: Polarized holographic lithography system for high-uniformity microscale patterning with periodic tunability

Fig. 5

Here, the orthogonal two-axis Lloyd’s mirror module consists of two mirrors (X- and Y-mirrors) and a grating holder, and mirrors 1–4 act on guiding the output beam of the He-Cd laser. HWP: half-wave plate.

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