Table 1 Spin development procedure used in our experiments

From: Methods for latent image simulations in photolithography with a polychromatic light attenuation equation for fabricating VIAs in 2.5D and 3D advanced packaging architectures

Step

Time (s)

Speed (rpm)

Accel. (rpm/s)

Special

Dispense Type

Quantity (mL)

1

5

100

100

Repeat 2x

Developer

12.5 per pass

2

60

40

100

   

3

5

200

100

 

None

N/A

4

60

200

100

N/A

DI Water

200 total

5

10

300

100

   

6

50

500

200

 

N/A

N/A

  1. Steps 1–3 develop the latent images, and steps 4–6 rinse the film. Steps 1–3 can be repeated as many times as required, depending on the target mold AR and the developer temperature. The listed dispense volume is the minimum to form a continuous puddle on a 100 mm substrate rotating at 40 rpm after an initial wetting volume of 25 mL.
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