Table 2 Main characteristics of nanoscale 3D direct-write technologies
From: MEMS inductor fabrication and emerging applications in power electronics and neurotechnologies
Technology | Patterning method | Ink/precursor | Deposited materials | Minimal deposit dimension [nm] | Throughput [m/s] | Inductor and year |
|---|---|---|---|---|---|---|
FluidFM72 | Direct ink extrusion | shear thinning ink | nanoparticles, polymers | 100–500 | 5 × 10–4 | Helices, 201674 |
NIR lasers | photopolymers, composites | polymers, composites | <100 | 2 × 10−2 | Multiturn microcoil, 201984 | |
E-beam | vapors of organic chemicals | metals, carbon compounds | ~1 | 5 × 10−8 | Moebius strip, 201987 | |
Ice lithography95 | E-beam | condensed gasses | cross-linked chemicals | <5 | 4 × 10−7 | ½ turn coil, 201294 |
