Fig. 1: Scheme of the multistep miniaturization approach using prestressed polymer films. | Microsystems & Nanoengineering

Fig. 1: Scheme of the multistep miniaturization approach using prestressed polymer films.

From: High-resolution fabrication of nanopatterns by multistep iterative miniaturization of hot-embossed prestressed polymer films and constrained shrinking

Fig. 1

a, b Fabrication of polymer working stamp. c Hot embossing the prestressed film. d Constrained shrinking. e Cast PDMS mold. f Soft imprint polymer pattern on Si substrate. g RIE Si substrate. h Clean patterned Si substrate which is used as a master for the next miniaturization step. SEM images of the results of a complete miniaturization cycle for i Si master, j imprint on prestressed film, k shrunk pattern, l new Si master

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