Fig. 1: Concept of massively parallel direct writing of nanoapertures using a multi-optical probe system and super-resolution near-fields.

a Schematic of a massively parallel direct-writing system. b Direct-writing parts and multi-optical probe system using glass FZP array (Photo and SEM image 20 × 20 glass FZP array on K-PG375 glass of 10 × 10 mm²). c Schematic of multi-layered PCM for super-resolution near-field effect. In the multi-layered PCM, the PCM layers are Sb₆₅Se₃₅ and the dielectric layers are composed of ZnS-SiO₂. The upper dielectric layer is 180 nm thick, the first PCM layer is 20 nm thick, the medium dielectric layer is 5 nm thick, the second PCM layer is 10 nm thick, and the bottom dielectric layer is 5 nm thick. d Schematic of the direct-writing process using the nano-optical nonlinear effect with Sb₆₅Se₃₅. When the laser is focused on the first PCM layer, the absorbed power is converted into heat; this creates a nano-optical aperture, which generates a nanofocused beam that generates a sub-diffraction nanoaperture on the second PCM layer