Fig. 1: Fabrication process and shape design of the MEA. | Microsystems & Nanoengineering

Fig. 1: Fabrication process and shape design of the MEA.

From: Grid cell remapping under three-dimensional object and social landmarks detected by implantable microelectrode arrays for the medial entorhinal cortex

Fig. 1

a Three layers, containing the insulating layer, conducting layer, and substrate, were patterned to form the structure of the MEA. b Optical photograph of the tip of the MEA. c Illustration of the arrangement of MEA probes according to the shape of the MEC (left) and a sagittal brain section with red traces of the implanted MEA (right)

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