Fig. 1: Schematics of fabrication technology for microposts with nanopillars.
From: Effects of nanopillars and surface coating on dynamic traction force
a SU-8 2000.5 is imprinted with simultaneous thermal and UV exposure. b UV lithography is used to pattern a nanopillar array. c Reactive ion etching in SF6/O2 to remove the uncovered SU-8 pattern. d Deep reactive ion etching (DRIE) of Si to form a micropost array and remove photoresist. e Removal of the residual layer of SU-8 nanopillars, DRIE of Si to form a nanopillar array and removal of SU-8 using plasma etching. f–j Double cast PDMS to generate the desired patterns. Trichloro(1H,1H,2H,2H perfluorooctyl)silane (FOTS) was used as an antisticking layer to promote easy demolding. Micrographs of (k) flat PDMS microposts, (l) surface with nanopillars, and (m) microposts with nanopillars.
