Fig. 5: Fabrication process and SEM images.
From: Self-aligned single-electrode actuation of tangential and wineglass modes using PMN-PT
a Initial layer stack schematic representation. b Wet etching via openings for bottom electrode access. c Top metal deposition of Au layer. d Lithographic patterning of etch gaps defining the resonator body smaller than the top electrode ensuring self-alignment. e Ion milling (CHISEL) of resonator body along with side tethers. f Releasing the resonator by XeF2 etching of the silicon layer. g Schematic top view of the fabricated disk resonator and geometrical definitions. h SEM image of the sidewall after CHISEL etch with annotated layers. Due to the cyclic changing incident ion beam, the photoresist layer seems to have different textures on the sidewall. i SEM image of the suspended device with two side tethers
