Fig. 10: Contrast curves for spin-coated polystyrene (1.2 kg/mol), coevaporated polystyrene–Cr, and evaporated (pure) polystyrene (1.2 kg/mol).
From: Electron beam lithography on nonplanar and irregular surfaces
All resists were exposed to 5-keV e-beams and developed with xylene20. Reproduced with permission from IOP Publishing (2014)
