Fig. 16: Ice lithography on carbon nanotubes.
From: Electron beam lithography on nonplanar and irregular surfaces
a TEM image of Al2O3 nanoparticles grown by ALD on a bundle of SWCNTs on which 5 Å of Ti had previously been deposited during ice lithography. The white arrows show the locations where ice was removed. b Schematic of the experiment (not to scale). An e-beam dose of 3 C/cm2 (100 pA at 30 keV) was used to pattern a 60-nm-thick layer of ice55. Reproduced with permission from ACS Publications (2012)
