Fig. 19: EBL on an AFM cantilever by using PMMA brush.
From: Electron beam lithography on nonplanar and irregular surfaces
a Contrast curve of a 9-nm-thick monolayer PMMA brush (1.6% MAA). b SEM image of the grating pattern obtained using a monolayer PMMA brush followed by pattern transfer, showing high-resolution lines with a width of 30 nm. c, d SEM images of a grating fabricated near the corner exposed at 66 pC/cm. e, f SEM images of the grating on the side slope at 56 pC/cm25. Reproduced with permission from Wiley-VCH (2016)
