Fig. 20: Schematic diagram of the fabrication process26.
From: Electron beam lithography on nonplanar and irregular surfaces
1. Spin coat PMMA (1.6% MMA). 2. Wash away bulk PMMA. 3. E-beam lithography. 4. Thermal development. 5. Etch Al in diluted HF. 6. Transfer the pattern into silicon by RIE. Reproduced with permission from ACS Publications (2017)
