Fig. 1: Azimuthal rotation-controlled dynamic nanoinscribing (ARC-DNI): process principle and tunability of nanograting period. | Microsystems & Nanoengineering

Fig. 1: Azimuthal rotation-controlled dynamic nanoinscribing (ARC-DNI): process principle and tunability of nanograting period.

From: Azimuthal rotation-controlled nanoinscribing for continuous patterning of period- and shape-tunable asymmetric nanogratings

Fig. 1

a Scheme of azimuthal rotation-controlled dynamic nanoinscribing (ARC-DNI) process and cross-sectional SEM images of mold and representative asymmetric nanogratings fabricated by controlling azimuthal angle (θ) during ARC-DNI. θ is the angle between the mold grating line and the inscription stroke line, and it can be controlled by rotating the mold along the z-axis, as indicated in the lower-left corner. b Optical and top-view SEM images of the nanogratings fabricated using ARC-DNI at θ values of 15°, 30°, 45°, and 60° on PC substrates at the temperature, force, and inscribing speed of 150 °C, 2 N, and 1 mm/s, respectively. c Calculated and measured periods of the nanogratings fabricated using ARC-DNI at various θ values

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