Fig. 4: Adaptive light pattern strategy for OET manipulation and its analysis.
a The adaptive light pattern design process. b Curves representing Ls as a function of the center-to-center distance d, shown both before and after the implementation of the adaptive light pattern design strategy. With the adaptive approach, the minimum Ls is maintained at 22 µm, ensuring robust microparticle manipulation. In contrast, the non-adaptive pattern results in a minimum Ls of 0 µm, leading to ineffective control and potential microparticle escape. c Electric potential and Maxwell stress tensor distributions for two microparticles positioned at different locations within the adaptive light pattern. d DEP force distribution along the X-axis and e Y-axis for a microparticle located at various positions in the left half of the adaptive light pattern. f Force analysis and corresponding microscope images of two particles moving leftward and g downward under the adaptive light pattern strategy (supplementary Movie S2)
