Fig. 2: Fabrication process of the water-soluble photodetector using a solvent-free material patterning technique. | Microsystems & Nanoengineering

Fig. 2: Fabrication process of the water-soluble photodetector using a solvent-free material patterning technique.

From: A micro-patterned transient UV photodetector enabled by solvent-free microfabrication

Fig. 2

a Schematic illustration of the solvent-free material patterning process enabled by photoresist (PR) dry transfer printing using an SMP stamp. b Patterned PR on a gel-film substrate. c PR picked up by the SMP. d PR released onto a PVA substrate. e Mo electrodes on the PVA substrate after Mo sputtering and PR removal. f ZnO patterned on Mo electrodes following ZnO deposition and PR removal. Scale bar: 200 μm

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