Fig. 4: The processing procedure of the MTJ sensor. | Microsystems & Nanoengineering

Fig. 4: The processing procedure of the MTJ sensor.

From: A laminated magnetic flux concentrator with low coercivity and high relative permeability for efficient flux modulation in MEMS magnetoresistive sensors

Fig. 4: The processing procedure of the MTJ sensor.

Schematic diagram of the MTJ fabrication process: a Deposition of MTJ multilayer film; b Define the bottom electrode using ion beam etching; c Pillar etching using ion beam etching; d Deposition of Si3N4; e Opening of connections using reactive ion etching; f Sedimentation of Cr (30 nm)/Au (300 nm)

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