Fig. 6
From: Control of laser plasma accelerated electrons for light sources
Transverse profile of the electron beam for different quadrupole strengths. Electron beam optics focusing on the screen downstream the undulator without slit, for the 176 MeV reference case. Experimental, simulated profiles and associate modelled phase-space plot a mismatched case, c well-focused case with a 1.5% correction of QUAPEVA 2, variation of the gradients of all the quadrupoles (permanent magnet and electromagnetic) by −2% (b) and +2% (d)
