Table 1 Simulated electron beam properties along the transport line

From: Control of laser plasma accelerated electrons for light sources

 

Location

Screen location

Source

First one

Before undulator

After undulator

Slice (MeV)

±1

±5

±1

±5

±1

±5

±1

±5

σx (μm)

0.6

0.6

1830

1830

575

748

634

913

σz (μm)

1.0

1.0

509

509

242

392

207

433

σs (μm)

1.0

1.0

9

9

17

72

18

73

εnx (mm.mrad)

1.0

1.0

58

93

58

92

58

92

εnz (mm.mrad)

1.0

1.0

15

31

15

30

15

28

  1. Numerical computations assuming a flat-top beam distribution, σ δ  = 1.64% (±5 MeV) and σ δ  = 0.33% (±1 MeV), using the measured divergences from Fig. 2a