Fig. 6

Fabrication of photopatterns using polymer thin films and the obtained images. a Schematic illustration of the fabrication of photopatterns: two-dimensional photopatterns were generated by the photo-masked UV irradiation of polymer thin films on silicon wafers. b Fluorescent images of the turn-off-type photopatterns (left) and the grayscale intensity profile of the arrowed area in the patterned P7 film. c Fluorescent images of the turn-on-type photopatterns (left) and the grayscale intensity profile of the arrowed area in the patterned P1b/2a film. The fluorescent images in (b) and (c) are taken under 330–380 nm UV illumination using a fluorescent microscope. d Photographs of the photopatterns taken under normal room light using an optical microscope. All images in (b), (c), and (d) share the same scale bar = 100 μm. e A fluorescent flower-like photopattern of P7 taken under UV irradiation at 365 nm using a camera.