Fig. 2: Cr patterns in the soft photomask are highly accurate and crack-free.
From: Near-field sub-diffraction photolithography with an elastomeric photomask
a, b Optical microscopy images of soft photomask containing Cr dot (a) and line (b) patterns. Scale bar: 20 μm. c, d Scanning electron microscopy (SEM) images of Cr dot (c) and line (d) patterns. The insets show magnified images. Scale bar: 10 μm.
