Fig. 3: Optical modulation induced by the substrate structure.
From: Optical-field driven charge-transfer modulations near composite nanostructures
a–c False-color plot of the optical field intensity, |F2|, as a function of incident wavelengths and position within the sample. d–f Optical-field intensity distribution within the sample corresponding to a cross section at 725 nm of a–c with the background colors representing the sample composition. Fused silica substrate (a, d), 4p-composite nanostructure (CNS) with an Al2O3 top layer of 10 nm (b, e), and 100 nm (c, f), respectively, and Donor:Acceptor (D:A) thin film. The horizontal lines materialize the different layers of materials.
