Fig. 3: Microstructure and chemical composition analysis of the Ti4.8%:a-Si memristor. | Nature Communications

Fig. 3: Microstructure and chemical composition analysis of the Ti4.8%:a-Si memristor.

From: Cluster-type analogue memristor by engineering redox dynamics for high-performance neuromorphic computing

Fig. 3: Microstructure and chemical composition analysis of the Ti4.8%:a-Si memristor.The alternative text for this image may have been generated using AI.

a Cross-sectional transmission electron microscopy (TEM) image of the Ti4.8%:a-Si memristor taken before/after programming (right inset: high-resolution image taken after programming). Red circles indicate Ag-clusters nucleated inside the Ti4.8%:a-Si switching layer. b X-ray photoelectron spectroscopy (XPS) spectra of Ti 2p3/2 for Ti4.8%:a-Si (red) and metallic Ti (black) films indicating the presence of Ti silicide. c XPS spectra of Ti 2p for Ag-Ti-Si co-deposited films with Ag/Ti ratios of 0, 3.9, and 6.8. The blue and red lines indicate the total Ti spectrum and the de-convoluted Ti0+ spectrum, respectively. As the Ag portion increases, Ti0+ states change to Tin+. d The Ti0+ and Tin+ (Tin+ = Titotal − Ti0+) valence state distribution of the Ti 2p spectra for the Ag-Ti-Si films with 0, 3.9, and 6.8 Ag/Ti ratios.

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