Fig. 3: Migration and annihilation of a Σ3{112} ITB under pulses.
From: Revealing the pulse-induced electroplasticity by decoupling electron wind force
a Migration displacements of the ITB with time. The migration displacements during electropulsing and relaxation are marked by red and blue solid lines, respectively. The black dash lines show the intervals between each migration. b Relative displacements during the three stages, with respect to the initial ITB position of each stage. c–f Non-directional migration of ITB under the pulses of (1.0 V, 3 ns) in stage I. Σ3{112} ITB and CTBs are marked by the white dash lines and yellow dash lines, respectively. M and T represent the matrix and twin in Au nanocrystal, respectively. The green arrow in d indicates the direction of the electrical current. g, h Relaxation-induced spontaneous ITB migration after electropulsing. i Directional migration induced by electropulsing during stage II, where the image force became dominated. j Fast surface annihilation after a pulse (stage III).
