Fig. 1: Schematic diagram of the SLM-based maskless patterning method for ultrafast manufacturing of multitype MSCs. | Nature Communications

Fig. 1: Schematic diagram of the SLM-based maskless patterning method for ultrafast manufacturing of multitype MSCs.

From: Laser maskless fast patterning for multitype microsupercapacitors

Fig. 1

a The original Gaussian laser is transformed by the Michelson interferometer into a double pulse with a pulse delay. It then passes through the SLM and is transported to the objective lens by the 4f system to realize micro/nano processing. b The magnified image of the objective lens and the sample can be processed within an extremely short period by controlling the 1, 2, and 3 subpulses to obtain various types of MSCs.

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