Table 1 Summary of ovonic threshold-switching device performances after annealing using different materials

From: The role of arsenic in the operation of sulfur-based electrical threshold switches

Material

Feature Size (nm)

Thickness (nm)

Selectivity

Jon (MA/cm2)

Ioff (A)

Vth (V)

Vh (V)

Speed (ns)

Endurance

Thermal stability

GeSAs20

60

10

105

21

2.3 × 10−9

3.3

~1.9

~10

107

450 °C/30 min

GeSAs25

60

10

104

16

1.2 × 10−8

2.5

~1.5

~10

109

450 °C/30 min

GeSAs43

60

10

104

12

1.5 × 10−8

2

~1.4

~10

~1010

450 °C/30 min

NGeCTe35

32

15

104

12

~2 × 10−8

~1.5

~1.2

400 °C/30 min

AsTeGeSiN30

30

40

103

11

~ 2 × 10−7

~1.5

500 °C/15 min

GeSe32

50

5

103

10−6

~1.4

~0.5

2

350 °C/4 min

TeAsGeSiSe33

350

20

104

0.44

5 × 10−9

3

350 °C/30 min

GeSeSbN34

350

106

0.2

10−10

2.5

~1.3

108

400 °C/30 min

CTe31

30

~10

105

11

5 × 10−9

~0.6

~0.3

<10

106

450 °C/30 min