Fig. 3: Scalability of the trench formation process.
From: Nanoscale reshaping of resonant dielectric microstructures by light-driven explosions
a Transmittance spectrum of a microresonator sample with upscaled dimensions (Si thickness is 600 nm). The resonance is observed around λres ≈ 7 μm, while the pump wavelength is λL ≈ 6.9 μm. The inset shows the local filed distribution within the half-height cross-section of the resonator. b Shot-controlled trench formation with the final width of ~120 nm at \(N=50\) shots. c Intensity control of the trench width from 150 nm at 0.15 J cm–2 to 550 nm at 1.2 J cm–2.
