Fig. 5: Orientational analysis of the rapid shear-rolling process. | Nature Communications

Fig. 5: Orientational analysis of the rapid shear-rolling process.

From: Roll-to-plate 0.1-second shear-rolling process at elevated temperature for highly aligned nanopatterns

Fig. 5

Nanostructural SEM images and orientational analysis of the rapid shear-rolling process at 36/32 mm s−1 of roller/substrate speeds and optimized conditions with temperature changes. SEM images and their orientational order maps of shear-rolled PS-b-PMMA films at (a) 220, (b) 240, (c) 260, (d) 280, and (e) 290 °C. f The plot of the orientational order parameters and g defect (dislocations and bridges) densities of the BCP patterns as temperature changes. Error bar represent the standard error of measured orientational order from at least five independent experiments. h GISAXS 2D patterns and i large area SEM images of shear-rolled PS-b-PMMA films at 280 °C. Source data are provided as a Source Data file.

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