Fig. 2: Computed concentration of photo generated holes at the MOx surface.
From: Understanding the light induced hydrophilicity of metal-oxide thin films
The concentration of photo generated holes at the surface is plotted as a function of MOx layer thickness in the limit of low surface recombination with \(s=0\) computed with Eq. 6 for relevant values of depletion layer width \(w\) and hole diffusion length \(L\). \(p(d)\) is expressed in units \(({I}_{0}A)/(h\nu {Dw})\), i.e., what is plotted in the figure is the dimensionless function \({L}^{2}/wd(1-1/\,\cosh ((d-w)/L))\), with w = 20 nm.
