Fig. 4: Selective metal vapor deposition on arbitrary 3D surfaces.

a Schematic illustration of the s-MVDL-assisted thin metal film patterning process on 3D surfaces. b Electrical characterization of 3D-pattered metal electrodes on bi-sinusoidal surfaces with various amplitudes. The line and symbol plots represent the resistance and surface area, respectively, and the histogram represents the resistance per unit area. The inset shows a schematic illustration of the experimental setup for the resistance measurements. c Photograph of the 3D-patterned Ag thin films (t = 100 nm) along bi-sinusoidal surface (2 A/P = 1) with the letters ‘SNU AXEL’ and the corresponding thermographic image visualizing the electrical connection along the 3D surface when biased at 2.7 V. d Photograph of the 3D-shaped spiral resonator fabricated using maskless patterning of Ag (t = 300 nm) for wireless power transfer. e Photographs of 3D-shaped spiral resonators on various complex multi-curvature surfaces. f Photograph of a top-emitting OLED fabricated on a hemispherical surface (κ₁ = κ₂ = 0.02 mm⁻¹) at a constant current bias of 1 mA. The inset shows a photograph of the OLED in the off-state.